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Morphology control of chemically deposited nanostructured PbS thin films | ||
| Journal of Interfaces, Thin Films, and Low dimensional systems | ||
| دوره 3، شماره 1، اسفند 2019، صفحه 245-250 اصل مقاله (444.93 K) | ||
| نوع مقاله: Original Article | ||
| شناسه دیجیتال (DOI): 10.22051/jitl.2020.25675.1028 | ||
| نویسندگان | ||
| Hajar Farshidi* 1؛ Alimorad Rashidi1؛ Amirali Youzbashi2؛ Mehdi Heidari Saani3 | ||
| 1Nanotechnology Research Center, Research Institute of Petroleum Industry | ||
| 2Research Department of Semiconductor, Materials and Energy Research Center | ||
| 3Department of Physics, Malek-Ashtar University of Technology, Isfahan, Iran | ||
| چکیده | ||
| PbS thin films were grown on glass substrates by chemical bath deposition (CBD) using lead nitrate, thiourea and sodium hydroxide in aqueous solutions during different deposition times (30-150 min.). The microstructure and morphology of the films were investigated using X-ray diffraction, field emission scanning electron microscopy and atomic force microscopy. The results indicate that deposition time is an important parameter in determining the dominant mechanism of deposition and consequently the characteristics of the film. The active deposition mechanism changes from cluster to ion-by-ion mechanism during the deposition reaction. Therefore, film properties such as shape, size, roughness and preferred orientation change completely. | ||
| کلیدواژه‌ها | ||
| PbS thin films؛ Chemical bath deposition؛ Deposition mechanism؛ Deposition time | ||
| عنوان مقاله [English] | ||
| کنترل مورفولوژی لایه نازک نانوساختار PbS ترسیب شده به روش شیمیایی از طریق مکانیسم رسوب | ||
| نویسندگان [English] | ||
| هاجر فرشیدی1؛ علیمراد رشیدی1؛ امیرعلی یوزباشی2؛ مهدی حیدری ثانی3 | ||
| 1مرکز تحقیقات نانو، پژوهشگاه صنعت نفت، تهران، ایران | ||
| 2پژوهشکده نیمه هادی ها، پژوهشگاه مواد و انرژی، کرج، ایران | ||
| 3گروه فیزیک، دانشگاه صنعتی مالک اشتر، شاهین شهر، اصفهان، ایران | ||
| چکیده [English] | ||
| لایه‌های نازک سولفید سرب به روش رسوب حمام شیمیای (CBD) با استفاده از نیترات سرب، تیواوره و هیدروکسید سدیم با زمانهای رسوب متفاوت ( بین 30 تا 150 دقیقه) روی زیرلایه شیشه رشد داده شد. میکروساختار و مورفولوژی لایه‌های نازک با استفاده از الگوی پراش اشعه X، میکروسکوپ الکترونی روبشی نشر میدانی و میکروسکوپ نیروی اتمی بررسی شد. نتایج نشان می‌دهد که زمان رسوب یک پارامتر مهم در تعیین مکانیسم غالب رسوب و در نتیجه ویژگی های لایه نازک است. در طی واکنش رسوب، مکانیسم غالب رسوب از مکانیسم خوشه‌ای (cluster) به یون به یون تغییر می‌کند. بنابراین خصوصیات لایه نازک مانند شکل، اندازه، زبری و جهت‌گیری ترجیحی کاملا تغییر می‌کند. | ||
| کلیدواژه‌ها [English] | ||
| لایه نازک سولفید سرب, رسوب حمام شیمیایی, مکانیسم رسوب, زمان رسوب | ||
| مراجع | ||
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